Silicon carbide ceramic chuck/tray is a high-performance fixture
used in semiconductor, LED, photovoltaic and other precision
manufacturing fields, mainly used to fix and carry wafers, sapphire
substrates, silicon wafers and other materials. Its core material
is silicon carbide (SiC), which is made by precision machining, has
excellent physical and chemical properties, and can meet the
processing needs of high precision and high stability.
Product Parameter
| (Material property) | (Unit) | (ssic) |
| (SiC content) | | (Wt)% | >99 |
| (Average grain size) | | micron | 4-10 |
| (Density) | | kg/dm3 | >3.14 |
| (Apparent porosity) | | Vo1% | <0.5 |
| (Vickers hardness) | HV 0.5 | GPa | 28 |
*()
Flexural strength* (three points) | 20ºC | MPa | 450 |
| (Compressive strength) | 20ºC | MPa | 3900 |
| (Elastic Modulus) | 20ºC | GPa | 420 |
| (Fracture toughness) | | MPa/m'% | 3.5 |
| (Thermal conductivity) | 20°ºC | W/(m*K) | 160 |
| (Resistivity) | 20°ºC | Ohm.cm | 106-108 |
(Thermal expansion coefficient) | a(RT**...80ºC) | K-1*10-6 | 4.3 |
(Maximum operating temperature) | | oºC | 1700 |
Product feature
1.Ultra-high hardness and wear resistance: silicon carbide hardness
close to diamond, excellent wear resistance, can withstand
long-term high strength processing, significantly extend the
service life.
2. Excellent thermal management performance: high thermal
conductivity and low thermal expansion coefficient to ensure rapid
heat dissipation in high temperature environments and maintain
dimensional stability to avoid deformation caused by thermal
stress.
3. Excellent chemical stability: strong corrosion resistance, able
to withstand acids, alkalis and a variety of chemical solvents,
suitable for harsh process environment.
4. High flatness and surface finish: After precision machining, the
surface flatness is up to micron level, ensuring high precision and
low pollution during processing.
Product application
In semiconductor manufacturing, silicon carbide ceramic chuck can
be used for wafer cutting, polishing, lithography and other key
processes to ensure high precision processing. As a bearing
platform for sapphire substrate processing in LED production, it
supports cutting, grinding and epitaxial growth.
In addition, silicon carbide ceramic chucks are used as trays in
high temperature equipment such as CVD and PVD, using high
temperature processes to withstand extreme environments and
maintain stability. In the photovoltaic industry, it is used for
silicon wafer cutting and thin film solar cell manufacturing to
improve processing efficiency and yield.
Product display
