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Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing

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    Buy cheap Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing from wholesalers
     
    Buy cheap Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing from wholesalers
    • Buy cheap Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing from wholesalers
    • Buy cheap Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing from wholesalers
    • Buy cheap Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing from wholesalers
    • Buy cheap Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing from wholesalers
    • Buy cheap Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing from wholesalers

    Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing

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    Brand Name : ZMSH
    Payment Terms : T/T
    Delivery Time : 2-4 Weeks
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    Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing

    Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing


    Product Overview


    The Silicon Carbide (SiC) Ceramic Tray is a high-performance tray designed to support semiconductor wafers and other materials in high-temperature and chemically aggressive environments. Known for its excellent corrosion resistance, high thermal stability, and mechanical strength, the SiC tray ensures consistent performance and reliable support for critical processes such as epitaxy, diffusion, oxidation, and high-temperature sintering.


    SiC trays are widely used in semiconductor manufacturing, advanced ceramics production, chemical processing, electronics, optical components, aerospace, automotive, and medical device fabrication.



    Specifications



    PropertyValue
    MaterialHigh-purity Silicon Carbide (SiC)
    Purity99.9%
    ColorBlack
    Density3.0–3.2 g/cm³
    Poisson's Ratio0.15–0.21
    Fracture Toughness2–4 MPa·m^1/2
    Vickers Hardness21–28 GPa
    Flexural Strength400–600 MPa
    Compressive Strength2200 MPa
    Elastic Modulus400–450 GPa
    Thermal Expansion (20–1000°C)4–4.6×10^-6/K
    Thermal Conductivity100–230 W/m·K
    Maximum Operating Temperature1300–1650°C
    Electrical Resistivity1–4×10^5 Ω·cm
    AppearanceSmooth, uniform, low-porosity black tray



    Manufacturing Methods: Pressureless sintering, hot pressing, CVD coating, reaction-bonded.


    Key Features


    1. High Thermal Stability: Maintains performance at extreme temperatures, suitable for sintering and semiconductor processing.

    2. Mechanical Strength: High hardness and load-bearing capacity prevent deformation or cracking.

    3. Chemical Resistance: Withstands strong acids, alkalis, and corrosive chemicals.

    4. Thermal Conductivity: Efficient heat transfer for uniform processing temperatures.

    5. Low Thermal Expansion: Ensures dimensional stability under thermal cycling.

    6. Electrical Insulation: Provides reliable insulation for electronic applications.

    7. CVD Coating Options: Available for enhanced wear resistance and thermal shock protection.

    8. Customizable Sizes & Shapes: Supports specific process requirements.


    Applications


    • Semiconductor Manufacturing: Supports LED and wafer chips in epitaxy, diffusion, and oxidation processes.

    • High-Temperature Sintering: Provides stable support for ceramics and metals during sintering.

    • Chemical Processing: Handles aggressive chemicals safely in industrial or laboratory setups.

    • Electronics & Optics Production: Supports substrates and optical components requiring precise thermal control.

    • Aerospace & Automotive: Lightweight, strong trays suitable for components needing thermal management and corrosion resistance.

    • Medical Device Manufacturing: Suitable for chemical-resistant and sterilizable trays.

    • Battery Production & Solar Industry: Supports high-temperature processes for lithium-ion batteries and photovoltaic cells.

    • Laboratory & R&D: Ideal for experiments involving high heat or corrosive materials.

    • Powder Metallurgy & Glass/Ceramic Industry: Ensures uniform heating and reliable process control.


    Advantages


    • High purity and chemical inertness reduce contamination risk.

    • Stable mechanical properties under extreme conditions.

    • Excellent wear resistance for long-term use.

    • Lightweight yet durable for easy handling.

    • Versatile for multiple industrial applications.


    Packaging



    All Silicon Carbide Ceramic Tray are carefully packaged to minimize damage during storage and transportation, ensuring products arrive in pristine condition.


    FAQ



    1 Can SiC ceramic trays withstand extreme temperatures during semiconductor manufacturing?


    Yes, SiC ceramic trays are designed to withstand continuous operating temperatures of up to 1650°C, making them ideal for high-temperature processes such as epitaxy, diffusion, and oxidation in semiconductor and LED production.


    2 How resistant are SiC trays to corrosion and chemical exposure?


    SiC trays offer outstanding chemical resistance to strong acids, alkalis, plasma, and other corrosive environments. This makes them highly reliable for use in semiconductor processing, chemical reaction vessels, and other harsh industrial environments where material integrity is critical.


    3 Are SiC ceramic trays customizable in terms of size, shape, and coating?


    Yes, SiC ceramic trays can be customized to meet specific requirements, including dimensions, thickness, and surface finish. Additionally, we offer CVD coatings for enhanced wear resistance and improved thermal shock resistance, depending on your application needs.


    Summary



    ZMSH Silicon Carbide Ceramic Trays combine thermal, chemical, and mechanical excellence to provide a reliable platform for semiconductor wafers and advanced manufacturing processes. Their high precision, corrosion resistance, and thermal stability make them essential components in modern high-tech industries.



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